Yi Wei - Researcher Profile | RDL Research Database

Publications

3 shown

<i>In situ</i> Si flux cleaning technique for producing atomically flat Si(100) surfaces at low temperature

G. D. Wilk , Yi Wei , Hal Edwards +1 more

We have developed a method for removing oxides and producing atomically flat Si(100) surfaces with single atomic height steps using a Si flux cleaning technique. By introducing ...

1997 Applied Physics Letters 36 citations

Energetics of void enlargement in thermally grown ultrathin Si-oxide on Si(001)

Shaoping Tang , Yi Wei , Robert M. Wallace

1997 Surface Science 4 citations

Void formation on ultrathin thermal silicon oxide films on the Si(100) surface

Yi Wei , Robert M. Wallace , Alan Seabaugh

The formation of voids on the thermally grown (650 °C) ultrathin (∼1 nm) silicon oxide films on the Si(100) surface was investigated by using ultrahigh vacuum scanning tunneling...

1996 Applied Physics Letters 80 citations

Frequent Co-Authors

Researcher Info

h-index: 3
Publications: 3
Citations: 120
Institution: Texas Instruments (United States)

External Links

ORCID Profile Google Scholar

Identifiers

ORCID: 0000-0001-7013-159X

Impact Metrics

h-index 3

h-index: Number of publications with at least h citations each.