Gate oxide reliability projection to the sub-2 nm regime
The important components of reliability projection are investigated. Acceleration parameters are obtained for a 1.6 nm oxide with a soft breakdown criterion. Based on the physic...
Publications
1 shownFrequent Co-Authors
Researcher Info
- h-index
- 1
- Publications
- 1
- Citations
- 80
- Institution
- Alcatel Lucent (Germany)
External Links
Identifiers
- ORCID
- 0000-0001-7596-5868
Impact Metrics
h-index
1
h-index: Number of publications with at least h citations each.