Localized states in inverted silicon-silicon dioxide interfaces

1973 Journal of Physics C Solid State Physics 20 citations

Abstract

It is suggested that electrons in the inversion layer at an Si-SiO2 interface can behave like electrons in a two-dimensional disordered system. The conduction band will then have a tail of localized states and an associated mobility edge. It is shown that the wavefunctions of localized states near the edge (at energy Ec) will have a spatial extent which behaves as mod E-Ec mod -34/.

Keywords

ElectronSiliconConduction bandEnhanced Data Rates for GSM EvolutionCondensed matter physicsWave functionThermal conductionAtomic physicsInversion (geology)Materials sciencePhysicsOptoelectronicsQuantum mechanicsTelecommunicationsGeology

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Publication Info

Year
1973
Type
article
Volume
6
Issue
20
Pages
L379-L381
Citations
20
Access
Closed

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R. A. Abram (1973). Localized states in inverted silicon-silicon dioxide interfaces. Journal of Physics C Solid State Physics , 6 (20) , L379-L381. https://doi.org/10.1088/0022-3719/6/20/001

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DOI
10.1088/0022-3719/6/20/001