Effects of uniaxial stress on the cyclotron resonance in inversion layers on Si(100)

G. Abstreiter; P. Stallhofer; J. P. Kotthaus

doi:10.1016/0039-6028(80)90522-1

Keywords

ElectronCondensed matter physicsMagnetoresistanceDegenerate energy levelsCyclotron resonanceShubnikov–de Haas effectScatteringChemistryCyclotronMagnetic fieldFermi gasPhysicsQuantum oscillationsOptics

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Publication Info

Year: 1980
Type: article
Volume: 98
Issue: 1-3
Pages: 413-415
Citations: 7
Access: Closed

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APA Style

                            
                                    G. Abstreiter, 
                                
                                    P. Stallhofer, 
                                
                                    J. P. Kotthaus
                                
                            (1980). 
                            Effects of uniaxial stress on the cyclotron resonance in inversion layers on Si(100). 
                            Surface Science
                            , 98
                            (1-3)
                            , 413-415.
                            https://doi.org/10.1016/0039-6028(80)90522-1

Identifiers

DOI: 10.1016/0039-6028(80)90522-1