Keywords
SputteringTungsten disulfideMaterials scienceThin filmSputter depositionSubstrate (aquarium)Analytical Chemistry (journal)Pulsed DCGraphitePyrolytic carbonScanning electron microscopePartial pressureTungstenChemical engineeringChemistryComposite materialNanotechnologyMetallurgy
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Publication Info
- Year
- 1997
- Type
- article
- Volume
- 182
- Issue
- 3-4
- Pages
- 389-393
- Citations
- 41
- Access
- Closed
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Cite This
K. Ellmer,
Carsten Stock,
K. Diesner
et al.
(1997).
Deposition of c⊥-oriented tungsten disulfide (WS2) films by reactive DC magnetron sputtering from a W-target in Ar/H2S.
Journal of Crystal Growth
, 182
(3-4)
, 389-393.
https://doi.org/10.1016/s0022-0248(97)00355-2
Identifiers
- DOI
- 10.1016/s0022-0248(97)00355-2