Abstract
The complex index of refraction N=n−ik for amorphous SiO2 is derived in the energy range 0.03–1.0 eV by Kramers-Kronig analysis of reflectance data. The results are used to compute the transmission, reflectance, and absorptivity of thin layers of SiO2 on Si substrates in the vicinity of the 0.14-eV (9 μ) lattice absorption band of SiO2. The dependence of these quantities on the layer thickness and angle of incidence is discussed.
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Publication Info
- Year
- 1979
- Type
- article
- Volume
- 50
- Issue
- 2
- Pages
- 1053-1057
- Citations
- 101
- Access
- Closed
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Identifiers
- DOI
- 10.1063/1.326080