Photoproduction of clean H2 or O2 from water using oxide semiconductors in presence of sacrificial reagent

2007 Journal of Alloys and Compounds 36 citations

Keywords

SemiconductorReagentMaterials scienceHydrogen productionWater splittingNanocompositeOxideCharacterization (materials science)HydrogenNanotechnologyChemical engineeringAqueous solutionChemistryPhotocatalysisMetallurgyCatalysisOptoelectronicsOrganic chemistry

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Publication Info

Year
2007
Type
article
Volume
448
Issue
1-2
Pages
238-245
Citations
36
Access
Closed

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S. Ekambaram (2007). Photoproduction of clean H2 or O2 from water using oxide semiconductors in presence of sacrificial reagent. Journal of Alloys and Compounds , 448 (1-2) , 238-245. https://doi.org/10.1016/j.jallcom.2006.11.177

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DOI
10.1016/j.jallcom.2006.11.177