Abstract

Patterning of highly oriented pyrolytic graphite (HOPG) was demonstrated by oxygen plasma etching of lithographically patterned substrates. Periodic arrays of islands, or holes of several microns on an edge, were obtained on freshly cleaved HOPG surfaces which had been prepared with SiO2 mask stops and then oxygen plasma etched. The etching process is described, including a study of etch rate as a function of rf power, and morphology was characterized with scanning electron microscopy.

Keywords

Etching (microfabrication)Highly oriented pyrolytic graphitePyrolytic carbonPlasma etchingMaterials scienceGraphitePlasmaScanning electron microscopeOxygenReactive-ion etchingNanolithographyAnalytical Chemistry (journal)NanotechnologyChemical engineeringComposite materialChemistryFabricationPyrolysisLayer (electronics)

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Publication Info

Year
1999
Type
article
Volume
75
Issue
2
Pages
193-195
Citations
178
Access
Closed

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Xuekun Lu, Hui Huang, N. Nemchuk et al. (1999). Patterning of highly oriented pyrolytic graphite by oxygen plasma etching. Applied Physics Letters , 75 (2) , 193-195. https://doi.org/10.1063/1.124316

Identifiers

DOI
10.1063/1.124316